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October 1, 1998Japanese Journal of Applied Physics

High Rate Deposition of Microcrystalline Silicon Using Conventional Plasma-Enhanced Chemical Vapor Deposition

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LGLihui GuoShaanxi University of Science and TechnologyMKMichio KondoTokyo Institute of TechnologyMFMakoto FukawaAsahi Glass (Japan)

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Cite This Study

Guo et al. (1998) studied this question.

synapsesocial.com/papers/6a91514abe68d22e6965edf2https://doi.org/10.1143/jjap.37.l1116
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