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January 1, 1998Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Plasma and surface reactions for obtaining low defect density amorphous silicon at high growth rates

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AMAkihisa MatsudaNippon Medical School

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Akihisa Matsuda (1998) studied this question.

synapsesocial.com/papers/6a9df5ed8908ec8da0acb0a1https://doi.org/10.1116/1.581105
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