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March 1, 1990Japanese Journal of Applied PhysicsOpen Access

Spatial Distribution of SiH3 Radicals in RF Silane Plasma

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Authors

NINaoshi ItabashiHitachi (United Kingdom)NNNobuki NishiwakiNagoya UniversityMMMitsuo MaganeNagoya University

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Cite This Study

Itabashi et al. (1990) studied this question.

synapsesocial.com/papers/6a8ae98bf71fc1553cbe9529https://doi.org/10.1143/jjap.29.l505
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Also Consider

Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context:

  1. 1Measurement of the SiH3 Radical Density in Silane Plasma using Infrared Diode Laser Absorption Spectroscopy1988 · 80 citations
  2. 2Diffusion Coefficient and Reaction Rate Constant of the SiH3 Radical in Silane Plasma1989 · 84 citations
  3. 3Spatial concentrations of silicon atoms by laser-induced fluorescence in a silane glow discharge1984 · 77 citations
  4. 4Laser diagnostics of a silane plasma—SiH radicals in an a-Si:H chemical vapor deposition system1986 · 43 citations
  5. 5Spatial profiles of reactive intermediates in rf silane discharges1989 · 56 citations