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June 1, 1975IEEE Transactions on Electron Devices

Limitations of the CV technique for ion-implanted profiles

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Authors

CWChih-Wei WuDolby (Netherlands)EDE. C. DouglasAtomic Energy (Canada)CMC.W. MuellerMassachusetts Institute of Technology

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Wu et al. (1975) studied this question.

synapsesocial.com/papers/6a91794835eca4d44dab609fhttps://doi.org/10.1109/t-ed.1975.18130
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