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Recently, our work on the measurement of Si(111) single atomic steps has prompted us to investigate the algorithm for the calculation of a one-sided step height. We compared the results of a two-point subtraction and a histogram technique under different conditions of surface tilt with respect to the measuring frame. By evaluating a simulated Si(111) atomic step, we found its calculated height could deviate from the true value as high as 2% due to a misalignment of the measuring axis and sample axis of 0.1°.
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Fu et al. (1999) studied this question.
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