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Advantage of Highly Concentrated (≥90%) Ozone for Chemical Vapor Deposition SiO2 Grown under 200 °C Using Hexamethyldisilazane and Ultraviolet Light Excited Ozone, Kameda, Naoto, Nishiguchi, Tetsuya, Morikawa, Yoshiki, Kekura, Mitsuru, Nonaka, Hidehiko, Ichimura, Shingo
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Kameda et al. (2009) studied this question.
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