The CF, CF2and CF3radical densities and CHF3molecule density were measured in a CHF3electron cyclotron resonance (ECR) downstream plasma using infrared diode laser absorption spectroscopy (IRLAS). The intensities of emission lines F*, Ar*and Hα were also measured in a CHF3/3 % Ar ECR downstream plasma using optical emission spectroscopy (OES). These measurements were carried out as a function of the microwave power and the pressure with modulation of the power with an on-period of 15 ms and an off-period of 85 ms. On the basis of the results of IRLAS and OES measurements, the behaviors of the radicals in the ECR plasma have been investigated in detail.
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Takahashi et al. (1994) studied this question.
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