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February 1, 2002IEEE Electron Device Letters

Systematic characterization of Cl2 reactive ion etching for improved ohmics in AlGaN/GaN HEMTs

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Authors

DBD. ButtariACAlessandro ChiniGMGaudenzio Meneghesso

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Buttari et al. (2002) studied this question.

synapsesocial.com/papers/6a9ce3e474ebc55f2882d054https://doi.org/10.1109/55.981311
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