Ballistic and pocket limitations of mobility in nanometer Si metal-oxide semiconductor field-effect transistors

Room-temperature magnetoresistance of nanometer bulk Si n-type metal-oxide semiconductor field-effect transistors was measured at magnetic fields up to 10 T. The electron magnetoresistance mobility was determined for transistors with the gate length in 30 to 740 nm range and was shown to decrease with decreasing the gate length. We show that the mobility reduction is caused both by the ballistic and the pocket effect and that for the strong inversion these two effects are of a comparable magnitude.