This invited paper discusses chemical solution deposition (CSD) and characterization of ferroelectric and dielectric thin films. Liquid Source Misted Chemical Deposition (LSMCD) technology was employed to deposit thin films using Metal Organic Decomposition (MOD) precursors. The configuration of the LSMCD machine along with deposition conditions and parameters are discussed in detail. Thickness uniformity, repeatability and step coverage data are also reported. Finally, electrical properties of thin Y1 and BST films deposited by LSMCD are discussed.
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Solayappan et al. (1998) studied this question.
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