Effect of SiO2 Coating on Photoluminescent Properties of Ca- -SiAlON:Eu2+ Deposit Fabricated by Electrophoretic Deposition Process

The electrophoretic deposition (EPD) technique was employed to fabricate the deposit with a uniform surface on the ITO glass, by using the SiO 2 -coated Ca-α-SiAlON:Eu 2+ phosphor powder. The significantly increased photoluminescence (PL) intensity in the SiO 2 -coated Ca-α-SiAlON:Eu 2+ deposit was approximately 2-times stronger than that in the uncoated deposit. The external and internal quantum efficiencies (QE) could both be enhanced from 39% and 64% of the uncoated deposit to 46% and 74% of the coated one, respectively, due to the contribution of the SiO 2 coating. The temperature-dependent PL property revealed that the prepared deposit possessed a high thermal stability, which maintains a 90% of relative PL intensity at 150°C.