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February 15, 1989Journal of Applied Physics

A two-dimensional computer simulation for dry etching using Monte Carlo techniques

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Authors

JFJ. Ignacio Ulacia F.Siemens (Germany)JMJ.P. McVittieStanford University

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Cite This Study

F. et al. (1989) studied this question.

synapsesocial.com/papers/6a70973e26a7f98052dd11fahttps://doi.org/10.1063/1.342962
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