Synapse
⌘+K
Synapse
PulseExploreClubsResearchersJournals
Instagram
HomeClubsExplore
February 1, 1991Journal of Applied Physics

Measurement of ion impact energy and ion flux at the rf electrode of a parallel plate reactive ion etcher

View Full Paper
Ask AI
Bookmark
Share

Authors

AMA. ManenschijnPhilips (Netherlands)GJG. C. A. M. JanssenMarch of DimesEDE. van der DriftLeiden University

Discussion

Loading...

Member takes

Implication

Key Points

Key points are not available for this paper at this time.

Cite This Study

Manenschijn et al. (1991) studied this question.

synapsesocial.com/papers/6a82fb2df2457b8164efdd05https://doi.org/10.1063/1.347311
View Full Paper
Ask AI
Bookmark
Share

Also Consider

Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context:

  1. 1Energetic binary collisions in rare gas plasmas1979 · 159 citations
  2. 2An electrostatic probe technique for RF plasma1987 · 86 citations
  3. 3Calculation of Ion Bombarding Energy and Its Distribution in rf Sputtering1968 · 112 citations
  4. 4Elastic and Inelastic Scattering of Low-Velocity Ions: Ne+ in A, A+ in Ne, and A+ in A1959 · 114 citations
  5. 5Monte Carlo simulation of ion transport through rf glow-discharge sheaths1988 · 110 citations