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January 14, 1982Journal of Physics D Applied Physics

Diffusion of Si atoms and thin film deposition in a silane-argon plasma

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Authors

KTKatsuro TachibanaFukuoka UniversityHTHiroyuki TadokoroTokai UniversityHHHisatomo HarimaKobe University

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Tachibana et al. (1982) studied this question.

synapsesocial.com/papers/6a89339744eed047faeb14c9https://doi.org/10.1088/0022-3727/15/1/019
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Also Consider

Synapse has enriched 4 closely related papers on similar clinical questions. Consider them for comparative context:

  1. 1Desities of Amorphous Thin Films1979 · 43 citations
  2. 2Ion-Molecule Reactions in Silane1972 · 79 citations
  3. 3Ionic reactions in monosilane. Radiation chemistry implications1972 · 89 citations
  4. 4Resonance Radiation and Excited Atoms1972 · 1,527 citations