Radiation tolerant CMOS circuits can be made by building them in a thin film of silicon-on-sapphire (SOS) with a hard gate dielectric. Radiation effects in MOS devices are reviewed, and the problems associated with radiation tolerant CMOS/SOS devices are described. Some gate dielectric techniques which show promise in hardening CMOS circuits are presented, and the radiation behavior of Al2O3gate dielectrics are described.
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K. M. Schlesier (1974) studied this question.