Charge collection mechanisms in PMOS and NMOS transistors irradiated by single energetic ions and the corresponding response of an SRAM (static random-access memory) cell have been simulated. For an ion track through a p-channel, the RC network within the cell and the strength of the n-channel pull-down device will limit the amount of charge collected. In the case of the n-channel pull-down device, the direction of the ion strike (toward or away from the source) plays a major role in the upset of the cell. An ion path toward the source upsets at a lower LET (linear energy transfer) than one away from the source. This is the result of additional electrons injected from the source due to barrier lowering.>
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Woodruff et al. (1993) studied this question.
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