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Experimental heavy-ion responses of two variants of SiC power MOSFETs are evaluated. The devices have similar epitaxial thickness but different doping. The higher doping in the epitaxial region results in lower breakdown voltage, and typically leads to a lower threshold drain voltage at which single-event leakage current (SELC) occurs. Furthermore, the heavy-ion-induced SELC degradation in the drain and gate currents of the SiC MOSFETs exhibit a strong dependence on the heavy-ion’s angle of incidence. The devices’ behavior significantly alters when irradiated with heavy-ions at different incident angles under the same fixed bias and total fluence, as also confirmed by 3-D Technology Computer Aided Design (TCAD) simulations.
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Sengupta et al. (2025) studied this question.
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