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We have created high-resolution x-ray imaging devices using polycrystalline mercuric iodide (HgI(2)) films grown directly onto CMOS readout chips using a thermal vapor transport process. Images from prototype 400x400 pixel HgI(2)-coated CMOS readout chips are presented, where the pixel grid is 30 mum x 30 mum. The devices exhibited sensitivity of 6.2 muC/Rcm(2) with corresponding dark current of approximately 2.7 nA/cm(2), and a 80 mum FWHM planar image response to a 50 mum slit aperture. X-ray CT images demonstrate a point spread function sufficient to obtain a 50 mum spatial resolution in reconstructed CT images at a substantially reduced dose compared to phosphor-coated readouts. The use of CMOS technology allows for small pixels (30 mum), fast readout speeds (8 fps for a 3200x3200 pixel array), and future design flexibility due to the use of well-developed fabrication processes.
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Hartsough et al. (2009) studied this question.
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