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The binarized neural networks (BNNs) significantly reduce arithmetic and storage costs for edge inference, but repeated bitwise accumulation and memory access still limit system energy efficiency. This article presents leak-computing-in-memory (CIM), a256× 64static random access memory (SRAM)-based voltage-mode CIM macro that exploits the subthreshold leakage ofoff-state transistors as ultrahigh-impedance pseudo-resistors for low-energy analog accumulation. Unlike charge-sharing CIMs, the proposed scheme maintains a wide read-bitline (RBL) dynamic range while strongly suppressing the shoot-through current that typically limits voltage-mode operation. To compensate for the process, voltage, and temperature (PVT) sensitivity of leakage-based pull-up and pull-down paths, the leak-CIM employs a postfabrication N-well bias calibration scheme that restores their resistance balance. The postlayout simulations show that the calibrated macro maintains a normalized mean-squared error below1.12× 10⁻²across 40 global PVT conditions. Fabricated in a 22-nm bulk-CMOS process, the macro achieves up to 1799 TOPS/W and 31.67 TOPS/mm2across measured operating points. When the measured ADC characteristics are incorporated into a BNN inference model, leak-CIM attains 98.15% accuracy on MNIST and 86.04% on CIFAR-10.
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Tagata et al. (2026) studied this question.
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