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June 25, 2024ElectronicsOpen Access

Optimization of Contact Resistance and DC Characteristics for AlGaN/GaN HEMTs Utilizing Sub-10 nm Nanohole Etching

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Authors

HLHsin‐Jung LeeCLCheng-Che LeeHPHong-Ru Pan

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Lee et al. (2024) studied this question.

synapsesocial.com/papers/68e634e4b6db6435875c71fahttps://doi.org/10.3390/electronics13132490
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Also Consider

Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context:

  1. 1Study of the Effect of Etching Under the Source/Drain Area on the DC Characteristics of GaN HEMTs2025
  2. 2Fabrication and formation mechanisms of Ohmic conducts with low annealing temperature for GaN/AlN superlattice barrier HEMTs2024
  3. 3Enhancing Drain Current Performance of AlGaN/GaN HEMT through Graded AlGaN Barrier2024 · 4 citations
  4. 4Low contact resistance and high breakdown voltage of AlGaN/GaN HEMT grown on silicon using both AlN/GaN superlattice and Al0.07Ga0.93N back barrier layer2024 · 2 citations
  5. 5Improvement of AlGaN/ GaN based HEMT with high performance rate for integrated circuit design for wide range of applications2024