Energy and Disturbance Analysis of 1T-DRAM With Nanowire Gate-All-Around RFET

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The influence of the number of bias levels for realizing capacitorless dynamic random access memory (DRAM) in nanowire (NW) gate-all-around (GAA) reconfigurable transistor (RFET) is analyzed through simulations. Although a careful selection of bias levels can enhance retention (1.8 s at 85 °C), reduce energy consumption ( <tex-math notation="LaTeX">~ </tex-math> 0.3 fJ), and enhance current ratio (CR) ( <tex-math notation="LaTeX">~ 10^5 </tex-math> ) in NW GAA RFET, bias-induced word line (WL) and bitline (BL) disturbance in an array can limit 1T-DRAM performance. It is shown that NW GAA RFET DRAM exhibits immunity from all six BL disturbances up to 5 ms while WL disturbance is critical as three out of six possible cases are disturbed.