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March 1, 1996Journal of Applied Physics

Predictions of ion energy distributions and radical fluxes in radio frequency biased inductively coupled plasma etching reactors

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RHRobert J. HoekstraSandia National Laboratories CaliforniaMKMark J. KushnerUniversity of Michigan

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Hoekstra et al. (1996) studied this question.

synapsesocial.com/papers/6a72c44d75498292b70bb9b1https://doi.org/10.1063/1.361152
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